High-Quality InP Substrates
for the Future of Connectivity

InPhitek is a dedicated manufacturer of 6-inch indium phosphide (InP) single-crystal substrates. We supply the semiconductor materials that power high-speed optical interconnects, 5G/6G communications, and next-generation RF devices.

Who We Are

Founded by a team of semiconductor veterans with decades of combined experience at AXT, San'an Optoelectronics, and leading optical chip manufacturers, InPhitek is purpose-built to deliver high-quality InP substrates to the global semiconductor market.

We operate a pure 6-inch VGF (Vertical Gradient Freeze) production line — designed from the ground up for InP single-crystal growth. Our facility is equipped with state-of-the-art crystal growth furnaces and cleanroom infrastructure spanning ISO Class 5 to Class 7 environments.

Unlike broad-spectrum wafer manufacturers, InPhitek is 100% focused on InP. This specialization allows us to optimize every aspect of the manufacturing process — from polycrystalline synthesis to final wafer polishing — delivering consistent quality and competitive lead times.

6" InP

VGF-Grown Single-Crystal Substrate

InP-Focused

100% dedicated to indium phosphide substrates

Proven Process

Globally validated VGF technology platform

6-Inch Only

Pure large-diameter line, no 4-inch legacy costs

Customer First

Built by former chip makers — we understand your needs

What We Make

We manufacture 6-inch InP single-crystal substrates in two primary variants, covering the full spectrum of photonic and electronic applications.

Semi-Insulating InP Substrate

6-inch · Undoped · High Resistivity

Designed for RF and high-speed electronic devices where low parasitic capacitance and minimal RF loss are critical. Our semi-insulating substrates deliver consistent resistivity and excellent surface quality for epitaxial growth.

HBT HEMT 5G/6G Front-End Space & Defense RF

Conductive (N+) InP Substrate

6-inch · S-Doped · Low Resistivity

Engineered for photonic devices operating in the 1.55 μm telecommunications window. The N+ substrate provides an ideal lattice match for InGaAsP and InAlGaAs epitaxial layers used in high-speed laser and detector structures.

CW-DFB Laser EML PIN / APD Optical Interconnects

Quality & Performance

Every wafer is grown using the VGF (Vertical Gradient Freeze) method, known for its excellent crystalline uniformity and low defect density. Our quality control spans the entire process chain — from polycrystalline InP synthesis to final surface inspection.

≤500
EPD (cm⁻²) — Low dislocation density
≥72%
6-inch production yield target
6"
Pure large-diameter with roadmap to 8"

How We Make It

We master the complete InP substrate manufacturing chain — from polycrystalline synthesis to single-crystal growth and final wafer processing.

Full InP Substrate Manufacturing Process

High-Purity
In + P
Raw Materials
★ Polycrystalline InP
Synthesis
Single-Crystal InP
VGF Crystal Growth
Wafer Processing
Slice · Lap · Polish
Inspection
QA Release

In-house polycrystalline synthesis is a key differentiator — enabling cost control, supply security, and vertical integration.

VGF Crystal Growth

Vertical Gradient Freeze furnaces deliver superior thermal uniformity, low defect density, and high reproducibility for 6-inch InP crystals.

InP Poly-Synthesis

In-house capability to synthesize polycrystalline InP from high-purity indium and phosphorus — reducing raw material dependency and cost.

Process Control

Real-time monitoring and closed-loop control of temperature profiles, crucible positioning, and cooling rates for consistent batch quality.

Wafer Processing

Full back-end processing line including slicing, lapping, polishing, and cleaning — all under ISO Class 5–7 cleanroom conditions.

Inspection & Metrology

X-ray diffraction, PL mapping, IR transmission, and surface defect inspection to guarantee every wafer meets customer specifications.

Furnace Design

Our team is capable of in-house crystal furnace design — enabling progressive replacement of third-party equipment and continuous process optimization.

Our People

We are a team of semiconductor engineers and operators who have built and run InP production lines at the world's leading compound semiconductor companies.

DZ

Dr. Zhou

Co-founder & Chairman

MIT PhD in semiconductor physics. Experience across chip design, manufacturing, operations, and sales. Drives strategy, partnerships, and market expansion.

DS

Dr. Sun

Co-founder & CEO

Former Head of Crystal/Wafer R&D at AXT and San'an IC. Holds proprietary technology for polycrystalline InP synthesis. Full 6-inch VGF production experience.

YG

Mr. Yueming Guan

Co-founder & Director of Crystal Growth Engineering

Recognized InP crystal growth expert with three decades of experience at AXT (1988–2014). Led development and commercialization of 4-inch and 6-inch InP single crystals. Expertise in crystal quality improvement, yield enhancement, and defect reduction for high-volume production.

RL

Mr. Raymond Li

Co-founder & Director of Wafer Fabrication

Experienced semiconductor manufacturing executive. Former Wafer Fab Manager at AXT Fremont and Deputy General Manager of TMCrystal Beijing. Expertise in wafer fabrication operations, facility management, process optimization, and supply chain management.

Our Mission & Goals

We exist to provide the world's optical communications and RF semiconductor industries with a reliable, high-quality source of InP substrates — strengthening the global supply chain and enabling the next generation of connected technology.

01

Quality First

Deliver consistently high-yield, low-defect InP substrates that meet the exacting standards of Tier-1 optical chip manufacturers worldwide.

02

Scale Responsibly

Grow from pilot production to 12,000–15,000 wafers per month at full capacity, serving both domestic and international customers.

03

Technology Independence

Continue developing in-house polycrystalline InP synthesis and proprietary furnace design to reduce dependency on imported equipment and materials.

04

Customer Partnership

Work closely with epitaxy foundries and optical chip makers to co-develop next-generation substrate specifications for 1.6T, 3.2T, and beyond.

05

Talent Development

Build a world-class team of crystal growth engineers and process specialists, fostering long-term expertise in compound semiconductor manufacturing.

06

Global Reach

Become a recognized InP substrate supplier in both Asian and Western markets, trusted for quality, delivery, and technical support.

YEAR 1
Establishment
Facility built, equipment installed, first samples delivered
YEAR 2
Production Ramp
Volume manufacturing with yield >60%
YEAR 3
Full Capacity
12K–15K wafers/month, yield ≥70%
ONWARD
Industry Leader
Recognized global InP substrate supplier

Let's Connect

Interested in learning more about our products or discussing potential collaboration? We'd love to hear from you.

info@inphitek.com